Large - scale ion beam etching facility

Main applications :

Mainly used in research or produce of large sized optical elements by ion beam etching . It is composed of ion beam etching system , ion beam detect system , precisely motor-driven sample holder , insitu laser measurement system , pumping system , and gas circuits control system .

Specifications :

• Ultimate vacuum : 5 × 10^-4Pa ; working vacuum : 5 × 10^-2Pa .
• Etching area : 400 × 400 mm²
• Longitudinal travel distance : 450 ± 0.2 mm
• Lateral deflection : ± 0.02 mm
• Speed uniformity : < 0.5 %