Applications :

Superconducting film , semiconducor film, superhard film prepared that is a suitable way to deposition film.

Specification :

• Ultimate vacuum : 6.6×10^-5 Pa
• Deposition chamber : Spherical chamber ø50mm; With valve for replacing sample; incidence laser windows; sample holder and others flange interface ;
• Sample holder : Size of the sample is 2-inch . The antioxidative heating elements can be used in a long time at the temperature of 800°C under oxygen atmosphere . The temperature controlling precision is ±1°C and it is rotational at a 0-30rpm/min adjustable speed .
• Four position for : There are for targets materials in the system , the size of each is 2 Inch ; Each of the targets materials can be revolved to match a precision sputtering position . Rotation and Revolution are based on step motor drive .
• Gas circuits : Mass flowmeter is used .