Ultrahigh vacuum multi-target magnetron sputtering system

Description :

Our magnetron sputtering facility has been formed product series. It has several models, with single chamber, double chambers, or multi chambers. It is compatible with thermal evaporation, e-beam, and laser ablation to form a multi functional coating system.

Our products is most suitable for research on new materials, new devices, and new processes. Moreover, our multi-chamber successively magnetron sputtering coating system has been used in productive manufacturing.

We have designed different coating systems with single face target, rectangular target or cylindrical target, electromagnetic target, and target-pairs. D.C or RF power supply is compatible in our system. The molecular pump is adopted to provide clean and high vacuum. Metal films, semiconductor films, dielectric films, and multi layers can be deposited. Pre chambers can be selected for anti sputtering clean or heat treatment the samples.

Our facility is fully functional, with advanced technical level, and can be specially designed to fulfill the customer's demands.

Applications: deposition of functional films, such as semiconductor film, dielectric al films, insulator films, magnetic films, superhard films, solar cell films, etc.
The film thickness and quality can be monitored insitu.