JGP series ultrahigh vacuum multi-target magnetron sputtering facility
Specifications:
| Vacuum chamber: | Ø500 × 300 Ø 600 × 350 Ø 800 × 350 Ø 1000 × 1200 × 300 |
| Ultimate vacuum: | 6.6 × 10-8Pa |
| Sputtering target: | Ø 50 - Ø 200, totally up to 4 targets; DC and RF compatible, Water cooled Options: rectangular target 300 × 120 Cylindrical target: Ø 76 × 300 - 700 Electromagnetic target: Ø 70 |
| Sample size: | Ø 50 - Ø 150, Ø 200 × 300 Temperature range RT - 600 °C cooling, heating, anti sputtering clean, revolution and rotation can be realized. Options: film thickness monitoring, reaction sputtering, ion beam enhanced magnetron sputtering. |
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